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Ionic Equilibria in Mixed Chloride Solution of Nickel and Cobalt
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이만승 Man Seung Lee , 오영주 Young Joo Oh |
KJMM 42(9) 767-771, 2004 |
ABSTRACT
A chemical model was developed for the mixed chloride solution of nickel and cobalt at 25℃. This model consisted of chemical equilibria, mass and charge balance equations. The activity coefficients of solutes and water activity were calculated by using Bromley equation. Cobalt ion has a strong tendency to form complexes with chloride ion such as CoCl₃^(-) and CoCl₄^(2-), while the nickel chloride complex was only NiCI`. Distribution of nickel and cobalt species with the compositions and pH values of the solution was obtained from the analysis of ionic equilibria in mixed chloride solutions. The predicted pH values for NiC1₂-CoC1₂-HCI-H₂O system agreed well with those measured at 25℃ up to ionic strength of 9.53 m.
keyword : NiCl2, CoCl2, HCl, Ionic equilbira, Bromley, pH
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Agglomeration of Copper Films by H2 Annealing
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배준우 Joon Woo Bae , 임재원 Jae Won Lim , Minoru Isshiki |
KJMM 42(9) 772-776, 2004 |
ABSTRACT
The agglomeration and time dependence of Cu films in Cu(100 nm)/Ta(50 nm)/Si structure deposited by ion beam deposition was examined. Copper thin films were annealed at 650℃ for 1 to 60 min in hydrogen atmosphere. The surface morphology, crystalline microstructure and electrical resistivity were investigated by field-emission scanning electron microscopy, X-ray diffraction and Van der Pauw method, respectively. Experimental results revealed that the nucleation and growth of voids ocurred in the copper film annealed for 5 min. Further annealing made the film a connected island structure and then isolated island structure.
keyword : Copper, Void, Agglomeration, Resistivity, Thin film
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