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Vol.14, No.4, 359 ~ 368, 1976

Title

Relation between preferred orientation and Microstructure of Chromium Electrodeposits

박정열 , 이동녕 Jeong Real Park , Dong Nyung Lee

Abstract

Chromium was electrodeposited in the standard Sargent bath at temperatures from 35 to 75℃ over the ranges of the current: density from 25 to 200A/d㎡. All the chromium deposits had the bcc structure. The preferred orientation (or texture) of the deposits ranged from the random to the <111> or <211> preferred orientations depending on electrolysis conditions. The degree of development of the <111> preferred orientation increased with increasing bath temperature up to 65℃ and then decreased again at a given current density. It also increased with decreasing current density at a given bath temperature. Microstructures of the cross section of chromium deposits were found to be closely correlated with their preferred orientations. Deposits with the strong <111> preferred orientation had the field orientated texture type structure. Those with the <211> preferred orientation had the structure of striations (or laminations). Those with the medium <111>-weak <211> preferred orientation had the structure of mixture of the field-orientated texture type and striations. Chose with random orientation had the unorientated-dispersion type structure. The hardness of the chromium deposits had a relation with their structure and residual stress. Deposits which brought about structure of striations and high residual stress had a relatively high hardness.

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