발간논문

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Vol.32, No.10, 1202 ~ 1210, 1994
Title
Concentration Distribution of Condensable Chemical Spec in a Diffusion Mixing Gas - Phase Reator
김규호 Kyoo Ho Kim
Abstract
It is described a computational model of the gas phase diffusion m reaction in the chemical vapor deposition reactor. The model, consider a diffusion mixing mode of source material for the reaction of SnCl₄ and water vapor, predicts condensable chemical species concentration distribution as a function of partial pressure of SnCl₄, reaction temperature and total vapor pressure in the reactor. It also predicts a particle size by collision theory. It is founded good agreement with experimental results. The model indicates concentraction distribution of condensable chemical species is important in predi partcle size.
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