발간논문

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Vol.42, No.9, 745 ~ 751, 2004
Title
Characterization of ZnO:Al Transparent Conduction Films produced by DC Magnetron Sputtering Method
이세종 Se Jong Lee , 윤현우 Hyon Woo Yoon , 김병섭 Byung Sub Kim , 이성욱 Sung Uk Lee , 박민우 Min Woo Park , 곽동주 Dong Joo Kwak
Abstract
Sputter-deposited Al-doped zinc oxide (ZnO:AI) is an attractive transparent conductive oxide material for application as transparent electrode in various electronic devices. In this work, the ZnO:AI films are prepared by the capacitively cooped DC magnetron sputtering on glass substrates and the influence of the substrate temperature and working gas pressure on the electrical, optical and morphological properties are investigated. We find that the ZnO:AI film with the optimum deposition parameters shows the resistivity of 0.96×10^(-3) Ω㎝ and the transmittance of average 90% in the wavelength range of the visible spectrum.
Key Words
ZnO:Al, Resistivity, Transmittance, DC magnetron sputtering
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