| Abstract |
| To enhance the efficiency of dye sensitized solar cells, we proposed crystalline anatase-TiO2 by using a low temperature process (150℃~250℃). We successfully fabricated 30 nm-TiO2 at a fixed atomic layer deposition condition of 1.0 sec of TDMAT pulse, 20 sec of TDMAT purge, 0.5 sec of H2O pulse, and 20 sec of H2O purge. In order to examine the microstructure, phase, and band-gap of the TiO2 respectively, we employed a Nano-Spec, transmission electron microscope, high resolution XRD, Auger electron spectroscopy, scanning probe microscope, and UV-VIS-NIR. We were able to fabricate a crystalline anatase-phase of 30 nm-TiO2 successfully at temperatures above 180℃. Our results showed that our proposed low temperature ALD process (below 200℃) might be applicable to glass and flexible polymer substrates. |
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| Key Words |
| thin films, deposition, crystallization, TEM, ALD |
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