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Vol.49, No.11, 845 ~ 853, 2011
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| Title |
| Fabrication and Evaluation Properties of Titanium Sintered-body for a Sputtering Target by Spark Plasma Sintering Process |
| 이승민 Seung Min Lee , 박현국 Hyun Kuk Park , 윤희준 Hee Jun Youn , 양준모 Jun Mo Yang , 우기도 Kee Do Woo , 오익현 Ik Hyun Oh |
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| Abstract |
| The Spark Plasma Sintering(SPS) method offers a means of fabricating a sintered-body having high density without grain growth through short sintering time and a one-step process. A titanium compact having high density and purity was fabricated by the SPS process. It can be used to fabricate a Ti sputtering target with controlled parameters such as sintering temperature, heating rate, and pressure to establish the optimized processingconditions. The compact/target(?) has a diameter of Φ150×6.35 mm. The density, purity, phase transformation, and microstructure of the Ti compact were analyzed by Archimedes, ICP, XRD and FESEM. A Ti thin-film fabricated on a Si/SiO2 substrate by a sputtering device (SRN-100) was analyzed by XRD, TEM, and SIMS. Density and grain size were up to 99% and below 40 ?m, respectively. The specific resistivity of the optimized Ti target was 8.63×10-6 Ω·cm. |
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| Key Words |
| spark plasma sintering process, Ti, temperature gradient, rapid sintering, sputtering target |
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