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Vol.51, No.8, 571 ~ 578, 2013
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| Title |
| Evaluation of Sputtered Films Using Mo Targets Prepared by the SPS Technique |
| 김민정 Min Jung Kim , 양준모 Jun Mo Yang , 유정호 Jung Ho Yoo , 정칠성 Chil Sung Jeong , 박현국 Ik Hyun Oh , 오익현 Hyun Kuk Park , 이갑호 Kap Ho Lee |
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| Abstract |
| The microstuructural properties and electrical characteristics of sputtering films deposited with Mo targets prepared by commercial hot isostatic pressing (HIP) and spark plasma sintering (SPS) were compared and analyzed. The analysis results revealed that the Mo films obtained from the SPS Mo targets had a quite similar resistivity and microstructure as the commercial HIP ones. Further, characteristics of the Mo films according to the sputtering conditions were investigated by XRD, SIMS and TEM techniques. Such films are expected to be used as electrode materials for display/solar cell devices. (Received October 29, 2012) |
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| Key Words |
| metals, sputtering, microstructure, transmission electron microscopy, spark palsma sintering |
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