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Vol.56, No.5, 300 ~ 306, 2018
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| Title |
| Effect of Carrier Gas on Microstructure and Macroscopic Properties of Tantalum Coating Layer Manufactured by Kinetic Spray Process |
| 김가령 Ga-ryung Kim , 김영균 Young-kyun Kim , 김형준 Hyung-jun Kim , 이기안 Kee-ahn Lee |
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| Abstract |
| This study attempted to utilizing the kinetic spray process to manufacture tantalum coating layer and investigated the effect of carrier gas on the microstructure and macroscopic properties of the coating layer. The initial powder feed stock was a massive powder with an average particle size of 24.35 μm and 99.99% purity. Tantalum coating layers were obtained utilizing kinetic spraying with two carrier gases, N2 and He. The manufactured tantalum coating layers featured dense structures without impurities at α-Ta phase regardless of the carrier gas used. The hardness and porosity of the layers were found to be 285 Hv and 0.04% at the He coating layer, and 270 Hv and 0.28% at the N2 coating layer. The measurement found that the coating layer produced with He gas had higher hardness and density than those of the coating layer produced with N2 gas. Through observation of the manufactured layer microstructure, the coating layer using He gas showed a particle laminating maneuver caused by larger plastic deformation. It is possible that, compared to the case of using N2 gas, higher particle speed can be applied when using He carrier gas to deposit tantalum powder. Based on observations above, this study also discussed possible methods to improve the physical properties of kinetic sprayed tantalum coating layer. |
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| Key Words |
| kinetic spraying, tantalum, carrier gas, nitrogen, helium, density, bond strength |
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